Exicor systems are used to measure the optics used in the world's most sophisticated optical equipment, lithography systems. These systems demand some of the most stringent low-level retardation measurements. Exicor provides these measurements repeatably and accurately.

Calcium Fluoride and Fused Silica are grown in cylindrical boules. The material is cut into cylinders 200-300mm in diameter. Following satisfactory birefringence measurement, these pieces may be formed into lenses.

Many of the lithography systems in use today are heavily polarization-dependent. Light passes through these systems at a very particular polarization state. Any additional birefringence in the lens train could effectively change the polarization state of the light, reducing intensity in an area where a polarizer is set to accept the expected polarization state. The change in intensity could mean that portions of the chip are not imaging correctly, which would adversely effect yield.

In this application, samples with a birefringence measurement nearing zero are preferable.

How Exicor has assisted customers:

• Exicor's unsurpassed sensitivity insures repeatable low-level measurements.
• Customers requiring multiple machines in different facilities can count on measurement accuracy and repeatability from machine to machine.
• Exicor provides the most precise measurement available at a faster speed than any competitor.

Suggested Exicor Systems:
Exicor 450AT
Exicor DUV