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A New Instrument for Measuring Both the Magnitude and Angle of Low-level Birefringence
Rev. Sci. Instrum., Oct 1999, Vol. 70 Issue 10, 3847-3854; B. Wang, T. Oakberg
This paper describes a highly sensitive method for measuring both the magnitude and the angle of the fast axis of low level linear birefringence in optical materials. Using the instrument, selected samples with different levels of linear birefringence have been studied.

Further Evaluation of the Exicor Birefringence Measurement System
SPIE Proceedings, Vol. 4103, 12 - 18, August 2000, B. Wang
The Exicor birefringence measurement system is evaluated for it's accuracy, long-term stability, and performance under low light intensity levels.

Accuracy assessment of a linear birefringence measurement system using a Soleil-Babinet compensator
Rev. Sci. Instrum., Vol. 72, No. 11, 4066-4070, Nov. 2001; B. Wang, W. Hellman
This paper uses a Soleil-Babinet compensator to assess the accuracy of the Exicor birefringence measurement system. Results show that the Exicor is capable of providing accurate measurements for linear birefringence below 125 nm with a relative uncertainty below 1%. Results also show that the system is self calibrating.

A Near Infrared Linear Birefringence Measurement System Using a Photoelastic Modulator
SPIE Proceedings, Vol 4399, 89-97, June 2001, B. Wang
This paper describes an instrument to measure linear birefringence using a near infrared (NIR) laser at 1523 nm. The magnitude and angle of the fast axis are simultaneously determined. Accuracy, repeatability, and other performance tests are also provided.

Linear birefringence measurement instrument using two photoelastic modulators
Opt. Eng.41(5) 981-987 (May 2002); B. Wang
This paper describes an instrument for measuring linear retardance in transparent optical components using two photoelastic modulators. This instrument is essentially a polarimeter specifically designed for measuring low-level linear retardance in high quality optical components. It provides retardation sensitivity of better than 0.005 nm at 632.8. Also described is a potential extension for this setup to DUV wavelengths.

Industrial Applications of a High-sensitivity Linear Birefringence measurement System
SPIE proceedings, July 1999, Vol. 3854-25; B. Wang, T. Oakberg, P. Kadlec
This paper introduces the Exicor birefringence measurement system that was designed for measuring low-level linear birefringence. Applications of the Exicor system are also presented.

Residual birefringence in photomask substrates
J. Microlith., Microfab., Microsyst., Vol. 1 No. 1, 43-48, April 2002; B. Wang
This paper discusses the different patterns and levels of residual birefringence that were discovered in photomask substrates when they were measured with the Exicor birefringence measurement system. The effect of linear birefringence in photomask substrates in determining wafer imaging quality is discussed.

Birefringence analysis improves 157-nm lithography optics
Laser Focus World, November 2000, B. Wang, K. Bates
This article examines birefringence present in calcium fluoride

Measurement of Excimer Laser Induced Birefringence in Fused Silica and Calcium Fluoride
SPIE Proceedings, Vol. 3998, 678-688, February 2000, B. Wang
This paper examines induced birefringence in fused silica and calcium fluoride samples that were exposed to ArF excimer laser irradiation.

Birefringence in fused silica and CaF2 for lithography
Solid State Technology, Feb 2000, 77-82; B. Wang
This article studies the residual birefringence in calcium fluoride and fused silica optical component samples. The effect of birefringence on optical lithography processes is also discussed. Several sample measurements are shown.