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The award-winning Exicor DUV measures at 157, 193 and 248nm. A nitrogen purge is required to measure at the lower wavelengths in this range. |
| Maximum Sample Size: |
|
400 mm x 400 mm x 270 mm |
| Maximum Sample Weight: |
|
120 kg |
| Range: |
|
0.5 nm to 78 nm |
| Resolution/Repeatability: |
|
±0.1 nm (Ret. < 5 nm) or ±2% (Ret. > 5nm) |
| Angular Resolution: |
|
±1° at Ret. >= 5 nm |
| Measurement Time: |
|
3 seconds per data point |
| Measurement Units: |
|
nm (retardation), ° (angle) |
| Measurement Spot Size: |
|
3 mm |
| Modulation System: |
|
Hinds Instruments Ultra Low Birefringence Photoelastic Modulator |
| Wavelength: |
|
57 nm, 193 nm, or 248 nm (user selectable) |
| OPTIONS: |
|
193 nm only system |
| APPLICATIONS: |
|
Optical Lithography |